ASML Ships Newest High NA EUV Lithography System to Second Customer
AMSTERDAM (Reuters) – ASML, the leading supplier of equipment to computer chip makers, announced on Wednesday that it has shipped one of its latest “High NA” EUV lithography systems to a second customer. This comes after ASML previously shipped a High NA tool to Intel in December-January, without disclosing the identity of the second customer, which could potentially be TSMC or Samsung.
These cutting-edge machines come with a hefty price tag of around 350 million euros ($370 million) each and are expected to pave the way for new generations of smaller and faster chips. The adoption of the High NA system by major players like TSMC and Samsung is anticipated to significantly increase the number of transistors that can be integrated onto a single chip.
Intel has also revealed plans to incorporate High NA tools in its early production by 2026-2027 with the 14A series chips. ASML disclosed this sale alongside its first-quarter earnings report, which fell short of expectations.
The first High NA machine was assembled at ASML’s headquarters in Veldhoven, Netherlands, where companies embracing EUV technology are granted access for testing purposes. ASML has received orders for between 10 and 20 of these advanced machines.
Lithography systems play a crucial role in creating chip circuitry by using beams of light. ASML’s EUV systems, currently employed in producing most smartphone and AI chips, utilize extreme ultraviolet light to achieve design features as small as 13 nanometers in resolution, surpassing the size of a virus.
According to ASML’s website, the High NA machine has successfully demonstrated features at 10 nanometers, nearing its theoretical limit of 8 nanometers. This technological advancement marks a significant milestone in the semiconductor industry’s quest for smaller and more powerful chips.
(Reporting by Toby Sterling. Editing by Jane Merriman)